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| In this equipment, a silicon
dioxide (SiO2) film is formed on the wafer surface using high
temperatures, oxygen and water vapor. At the same time, gaseous
impurities are introduced in order to create the desired semiconductor
characteristics. |
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| Applications |
| Select a semiconductor manufacturing
application (below) and you will be presented with the optimum
sensing and control solution offered by Yamatake products. [Acrobat
Reader required] |
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